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Study on atomic layer deposited high-k HfO₂ film and reliability problem based on chlorine carbon residue
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 황철성 | - |
| dc.contributor.author | 조문주 | - |
| dc.date.accessioned | 2009-11-18T22:24:42Z | - |
| dc.date.available | 2009-11-18T22:24:42Z | - |
| dc.date.copyright | 2007. | - |
| dc.date.issued | 2007 | - |
| dc.identifier.uri | http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000042941 | eng |
| dc.identifier.uri | https://hdl.handle.net/10371/13527 | - |
| dc.description | 학위논문(박사) --서울대학교 대학원 :재료공학부,2007. | eng |
| dc.format.extent | xvi, 150 p. | eng |
| dc.language.iso | en | eng |
| dc.publisher | 서울대학교 대학원 | eng |
| dc.subject | HfO₂ | eng |
| dc.subject | ALCVD (ALD) | eng |
| dc.subject | high-k | eng |
| dc.subject | Chlorine | eng |
| dc.subject | carbon | eng |
| dc.subject | TDDB | eng |
| dc.subject | charge pumping | eng |
| dc.title | Study on atomic layer deposited high-k HfO₂ film and reliability problem based on chlorine carbon residue | eng |
| dc.type | Thesis | - |
| dc.contributor.department | 재료공학부 | - |
| dc.description.degree | Doctor | eng |
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