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(A) study on the strain variation by boron doping in SiGe epitaxial growth : SiGe 단결정막 성장 시 붕소 도핑에 의한 응력 변화에 관한 연구

DC Field Value Language
dc.contributor.advisor윤의준-
dc.contributor.author송석찬-
dc.date.accessioned2009-11-18T22:29:00Z-
dc.date.available2009-11-18T22:29:00Z-
dc.date.copyright2008.-
dc.date.issued2008-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000041514eng
dc.identifier.urihttps://hdl.handle.net/10371/13536-
dc.descriptionThesis(doctors) --서울대학교 대학원 :재료공학부,2008.8.eng
dc.format.extentxi, 121 leaves.eng
dc.language.isoeneng
dc.publisher서울대학교 대학원eng
dc.subject초고진공화학기상증착법eng
dc.subjectSiGeeng
dc.subject격자상수eng
dc.subjectboron dopingeng
dc.subjectboron 도핑eng
dc.subjectlattice contraction coefficienteng
dc.subjectSiGeeng
dc.subjectUHV-CVDeng
dc.subjectSieng
dc.subjectHRXRDeng
dc.subject격자수축계수eng
dc.subjectVASPeng
dc.subjectHRXRDeng
dc.subjectVASPeng
dc.subject응력변화eng
dc.title(A) study on the strain variation by boron doping in SiGe epitaxial growtheng
dc.title.alternativeSiGe 단결정막 성장 시 붕소 도핑에 의한 응력 변화에 관한 연구eng
dc.typeThesis-
dc.contributor.department재료공학부-
dc.description.degreeDoctoreng
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