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College of Engineering/Engineering Practice School (공과대학/대학원)
Dept. of Material Science and Engineering (재료공학부)
Theses (Master's Degree_재료공학부)
ALD(Atomic Layer Deposition) 증착법을 이용한 Bi2(Ti2-xSix)O7-y 유전박막의 증착 거동 및 물성 평가에 관한 연구
Growth mechanism and characteristics of Bi2(Ti2-xSix)O7-y deposited by atomic layer deposition
- Authors
- 김완돈
- Advisor
- 황철성
- Issue Date
- 2005
- Publisher
- 서울대학교 대학원
- Keywords
- Bi2(Ti2-xSix)O7-y (BTSO); Bi2(Ti2-xSix)O7-y (BTSO); Bi-Ti-O (BTO); Bi-Ti-O (BTO); 커패시터; capacitor; ALD; ALD; 고유전재료; dielectric constant; 유전율; leakage current density; 전극; composition ratio; 조성비; 누설 전류 특성; DRAM
- Description
- 학위논문(석사)--서울대학교 대학원 :재료공학부,2005.
- Language
- Korean
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000051038
https://hdl.handle.net/10371/14282
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