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Ir 기판 표면 처리에 따른 MOCVD Pb(Zr,Ti)O₃박막의 증착 및 특성에 관한 연구 : Deposition and characterization of MOCVD Pb(Zr,Ti)O₃thin films with in-situ surface treatment of Ir substrate

DC Field Value Language
dc.contributor.advisor황철성-
dc.contributor.author이근-
dc.date.accessioned2009-11-25-
dc.date.available2009-11-25-
dc.date.copyright2007.-
dc.date.issued2007-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000045726kor
dc.identifier.urihttps://hdl.handle.net/10371/14862-
dc.description학위논문(석사)--서울대학교 대학원 :재료공학부,2007.kor
dc.format.extentx, 100 장kor
dc.language.isoko-
dc.publisher서울대학교 대학원kor
dc.subjectPb(Zrkor
dc.subjectPb(Zrkor
dc.subjectTi)O₃kor
dc.subjectTi)O₃kor
dc.subject유기화학기상증착법kor
dc.subjectMOCVDkor
dc.subjectself-regulation windowkor
dc.subjectself-regulation windowkor
dc.subject전처리kor
dc.subjectpre-treatmentkor
dc.titleIr 기판 표면 처리에 따른 MOCVD Pb(Zr,Ti)O₃박막의 증착 및 특성에 관한 연구kor
dc.title.alternativeDeposition and characterization of MOCVD Pb(Zr,Ti)O₃thin films with in-situ surface treatment of Ir substratekor
dc.typeThesis-
dc.contributor.department재료공학부-
dc.description.degreeMasterkor
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