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(The) microstructure and the properties of TaNx diffusion barrier deposited by inductively coupled plasma assisted sputtering
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 이정중 | - |
| dc.contributor.author | 김성만 | - |
| dc.date.accessioned | 2009-11-25T02:46:50Z | - |
| dc.date.available | 2009-11-25T02:46:50Z | - |
| dc.date.copyright | 2008. | - |
| dc.date.issued | 2008 | - |
| dc.identifier.uri | http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000041104 | eng |
| dc.identifier.uri | https://hdl.handle.net/10371/15022 | - |
| dc.description | Thesis(masters) --서울대학교 대학원 :재료공학부,2008.2. | eng |
| dc.format.extent | vi, 40 장 | eng |
| dc.language.iso | en | - |
| dc.publisher | 서울대학교 대학원 | eng |
| dc.subject | 탄탈룸 나이트라이드 | eng |
| dc.subject | tantalum nitride (TaNx) | eng |
| dc.subject | 유도결합 플라즈마 | eng |
| dc.subject | inductively coupled plasma (ICP) | eng |
| dc.subject | 확산방지막 | eng |
| dc.subject | diffusion barrier | eng |
| dc.subject | 비정질 | eng |
| dc.subject | amorphous | eng |
| dc.subject | 미세구조 | eng |
| dc.subject | microstructure | eng |
| dc.title | (The) microstructure and the properties of TaNx diffusion barrier deposited by inductively coupled plasma assisted sputtering | eng |
| dc.type | Thesis | - |
| dc.contributor.department | 재료공학부 | - |
| dc.description.degree | Master | eng |
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