Publications
Detailed Information
Enhancement of growth rate in atomic layer deposition of dielectric materials
DC Field | Value | Language |
---|---|---|
dc.contributor.advisor | 김형준 | - |
dc.contributor.author | 원석준 | - |
dc.date.accessioned | 2019-07-10T04:08:54Z | - |
dc.date.available | 2019-07-10T04:08:54Z | - |
dc.date.issued | 2011-02 | - |
dc.identifier.other | 000000028952 | - |
dc.identifier.uri | https://hdl.handle.net/10371/158958 | - |
dc.identifier.uri | http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000028952 | ko_KR |
dc.description | 학위논문 (박사)-- 서울대학교 대학원 : 재료공학부, 2011.2. 김형준. | - |
dc.format.extent | xv, 160 p. | - |
dc.language.iso | eng | - |
dc.publisher | 서울대학교 대학원 | - |
dc.subject | 원자층증착법 | - |
dc.subject | 증착속도 | - |
dc.subject | 지르코늄 산화물 | - |
dc.subject | 하프늄 산화물 | - |
dc.subject | 타이타늄 산화물 | - |
dc.subject | 실리콘 산화물 | - |
dc.subject | 표면흡착 | - |
dc.subject | 촉매반응 | - |
dc.subject | Atomic Layer Deposition | - |
dc.subject | Growth Rate | - |
dc.subject | Zirconium Oxide | - |
dc.subject | Hafnium Oxide | - |
dc.subject | Titanium Oxide | - |
dc.subject | Silicon Oxide | - |
dc.subject | Surface Adsorption | - |
dc.subject | Catalytic Reaction | - |
dc.title | Enhancement of growth rate in atomic layer deposition of dielectric materials | - |
dc.type | Thesis | - |
dc.type | Dissertation | - |
dc.description.degree | Doctor | - |
dc.contributor.affiliation | 재료공학부 | - |
dc.date.awarded | 2011-02 | - |
- Appears in Collections:
- Files in This Item:
- There are no files associated with this item.
Item View & Download Count
Items in S-Space are protected by copyright, with all rights reserved, unless otherwise indicated.