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Growth behavior and phase change characteristics of Ge doped Sb-Te thin films for phase change memory application

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Authors

최설

Advisor
황철성
Major
재료공학부
Issue Date
2011-02
Publisher
서울대학교 대학원
Keywords
Ge doped Sb-Te플라즈마 강화 화학기상 증착법 (PECVD)상변화 메모리 (PRAM)상분리Plasma enhanced chemical vapor deposition (PECVD)PRAMPhase separation
Description
학위논문 (박사)-- 서울대학교 대학원 : 재료공학부, 2011.2. 황철성.
Language
eng
URI
https://hdl.handle.net/10371/158978

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