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Investigation on the characteristics of stress-induced hump in amorphous HfInZnO thin film transistors : HfInZnO로 구성된 산화물 박막 소자의 Stress로 인한 Hump 특성에 관한 연구

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Authors

김장현

Advisor
박병국
Major
전기. 컴퓨터공학부
Issue Date
2011-08
Publisher
서울대학교 대학원
Keywords
비정질 HIZO 박막소자hump빛과 음의 전압 스트레스Schottky 장벽둥글어진 게이트a-HIZO TFTshump characteristicslight and negative bias stressSchottky barrierrounded gate
Description
학위논문 (석사)-- 서울대학교 대학원 : 전기. 컴퓨터공학부, 2011.8. 박병국.
Language
eng
URI
https://hdl.handle.net/10371/159649

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