S-Space

Browse

Subject

Showing results 1 to 4 of 4

Issue Date	Title / Author(s) / Citation	File
2001	(111) 실리콘의 습식식각 특성과 그 응용 백승준	link
2012	TAD 세정액이 Cu CMP 공정 후에 미치는 영향 김승욱	link
2021-05	Removal of tetramethylammonium hydroxide (TMAH) in semiconductor wastewater using the nano-ozone H2O2 process Kim, Tae-Kyoung; Kim, Taeyeon; Lee, Inae; Choi, Kyungho; Zoh, Kyung-Duk Journal of Hazardous Materials, Vol.409	DOI
2022-10	Degradation of tetramethylammonium hydroxide (TMAH) during UV-LED/H2O2 reaction: Degassing effect, radical contribution, and degradation mechanism Kim, Tae-Kyoung; Lee, Donghyun; Lee, Changha; Hwang, Yu Sik; Zoh, Kyung-Duk Journal of Hazardous Materials, Vol.440, p. 129781	DOI