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Efficient Mode-Locking of Sub-70-fs Ti: Sapphire Laser by Graphene Saturable Absorber

DC Field Value Language
dc.contributor.authorBaek, In Hyung-
dc.contributor.authorLee, Hwang Woon-
dc.contributor.authorBae, Sukang-
dc.contributor.authorHong, Byung Hee-
dc.contributor.authorAhn, Yeong Hwan-
dc.contributor.authorYeom, Dong-Il-
dc.contributor.authorRotermund, Fabian-
dc.date.accessioned2021-01-31T08:28:55Z-
dc.date.available2021-01-31T08:28:55Z-
dc.date.created2020-11-09-
dc.date.issued2012-03-
dc.identifier.citationApplied Physics Express, Vol.5 No.3, p. 032701-
dc.identifier.issn1882-0778-
dc.identifier.other115271-
dc.identifier.urihttps://hdl.handle.net/10371/172159-
dc.description.abstractThe efficient passive mode-locking of a Ti: sapphire laser with a monolayer graphene saturable absorber is demonstrated for the first time. High-quality and large-area (1 in.) monolayer graphene, synthesized by chemical vapor deposition, exhibits ultrafast recovery times and excellent nonlinear absorption behavior for bulk solid-state laser mode-locking near 800 nm. The continuous-wave mode-locked Ti: sapphire laser generates 63-fs pulses with output powers up to 480 mW under stable operation at 99.4 MHz. (c) 2012 The Japan Society of Applied Physics-
dc.language영어-
dc.publisherJapan Soc of Applied Physics-
dc.titleEfficient Mode-Locking of Sub-70-fs Ti: Sapphire Laser by Graphene Saturable Absorber-
dc.typeArticle-
dc.contributor.AlternativeAuthor홍병희-
dc.identifier.doi10.1143/APEX.5.032701-
dc.citation.journaltitleApplied Physics Express-
dc.identifier.wosid000301344400017-
dc.identifier.scopusid2-s2.0-84863349861-
dc.citation.number3-
dc.citation.startpage032701-
dc.citation.volume5-
dc.identifier.sci000301344400017-
dc.description.isOpenAccessN-
dc.contributor.affiliatedAuthorHong, Byung Hee-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.subject.keywordPlusMU-M-
dc.subject.keywordPlusBULK LASER-
dc.subject.keywordPlusPULSES-
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  • Department of Chemistry
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