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Tailoring Interlayer Coupling in Few-Layer MoS2 with Stacking Configuration : Tailoring Interlayer Coupling in Few-Layer MoS<sub>2</sub> with Stacking Configuration

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Authors

Kim, Jong Hun; Jin, Kyung-Hwan; Jung, Yeonjoon; Lee, Gwan-Hyoung; Baik, Jaeyoon; Kim, Daehyun; Jo, Moon-Ho; Baddorf, Arthur P.; Li, An-Ping; Park, Jewook

Issue Date
2024-07
Publisher
American Chemical Society
Citation
ACS Applied Nano Materials, Vol.7 No.15, pp.17214-17220
Abstract
We manipulated the stacking configuration of a few-layer MoS2 to investigate the impact of interlayer coupling on electrical band engineering. By simultaneously synthesizing two distinct stacking types of MoS2 islands, wedding cake (W) and spiral (S), on the same substrate, we explored layer-dependent electrical properties under identical experimental conditions. We used multiple scanning probe microscopy techniques to map local electronic properties with respect to the number of layers, stacking configurations, and local heterogeneities. First-principles calculations verified the role of distinct interlayer coupling in terms of the interlayer distance. Our findings highlight the critical role of interlayer coupling in applications of transition metal dichalcogenides.
URI
https://hdl.handle.net/10371/209061
DOI
https://doi.org/10.1021/acsanm.4c02834
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  • College of Engineering
  • Department of Materials Science & Engineering
Research Area 2D materials, 2차원 물질, Smiconductor process, semiconductor devices, 반도체 공정, 반도체 소자

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