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Development of large-area, multi-helicon plasma source for TFT-LCD processing : 다중 헬리콘 방전을 이용한 TFT-LCD 공정용 대면적 플라즈마원 개발

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dc.contributor.advisor황용석-
dc.contributor.author김윤재-
dc.date.accessioned2010-01-16T11:38:42Z-
dc.date.available2010-01-16T11:38:42Z-
dc.date.copyright2002.-
dc.date.issued2002-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000061868eng
dc.identifier.urihttps://hdl.handle.net/10371/33861-
dc.descriptionThesis (master`s)--서울대학교 대학원 :원자핵공학과,2002.en
dc.format.extentvi, 73 leavesen
dc.language.isoenen
dc.publisher서울대학교 대학원en
dc.titleDevelopment of large-area, multi-helicon plasma source for TFT-LCD processingen
dc.title.alternative다중 헬리콘 방전을 이용한 TFT-LCD 공정용 대면적 플라즈마원 개발-
dc.typeThesis-
dc.contributor.department원자핵공학과-
dc.description.degreeMasteren
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