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In-situ EIS of oxide film formed on nickel-plated alloy 600 : 니켈 도금 표면에 생성된 산화막의 전기화학적 특성에 관한 연구
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 황일순 | - |
| dc.contributor.author | 오시형 | - |
| dc.date.accessioned | 2010-01-16T11:38:51Z | - |
| dc.date.available | 2010-01-16T11:38:51Z | - |
| dc.date.copyright | 2002. | - |
| dc.date.issued | 2002 | - |
| dc.identifier.uri | http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000061854 | eng |
| dc.identifier.uri | https://hdl.handle.net/10371/33864 | - |
| dc.description | Thesis (master`s)--서울대학교 대학원 :원자핵공학과,2002. | en |
| dc.format.extent | ix, 121 p. | en |
| dc.language.iso | en | en |
| dc.publisher | 서울대학교 대학원 | en |
| dc.title | In-situ EIS of oxide film formed on nickel-plated alloy 600 | en |
| dc.title.alternative | 니켈 도금 표면에 생성된 산화막의 전기화학적 특성에 관한 연구 | - |
| dc.type | Thesis | - |
| dc.contributor.department | 원자핵공학과 | - |
| dc.description.degree | Master | en |
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