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초고집적 소자의 금속배선을 위한 화학증착 공정에서 계단도포성 개선을 위한 새로운 기술 : PACVD (Plasma assisted chemical vapor deposition) : A New technology for improvement of the step coverage in CVD process for ULSI metallization : PACVD (Plasma assisted chemical vapor deposition)
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 주승기 | - |
| dc.contributor.author | 김동찬 | - |
| dc.date.accessioned | 2010-01-16T13:54:42Z | - |
| dc.date.available | 2010-01-16T13:54:42Z | - |
| dc.date.copyright | 1999. | - |
| dc.date.issued | 1999 | - |
| dc.identifier.uri | http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000071449 | kor |
| dc.identifier.uri | https://hdl.handle.net/10371/34590 | - |
| dc.description | 학위논문(박사)--서울대학교 대학원 :금속공학과,1999. | ko |
| dc.format.extent | xii, 162 장 | ko |
| dc.language.iso | ko | ko |
| dc.publisher | 서울대학교 대학원 | ko |
| dc.subject | 플라즈마 | ko |
| dc.subject | plasma | ko |
| dc.subject | 화학증착 | ko |
| dc.subject | CVD | ko |
| dc.subject | 알루미늄 | ko |
| dc.subject | aluminum | ko |
| dc.subject | DMEAA | ko |
| dc.subject | metallization | ko |
| dc.subject | 배선 | ko |
| dc.title | 초고집적 소자의 금속배선을 위한 화학증착 공정에서 계단도포성 개선을 위한 새로운 기술 : PACVD (Plasma assisted chemical vapor deposition) | ko |
| dc.title.alternative | A New technology for improvement of the step coverage in CVD process for ULSI metallization : PACVD (Plasma assisted chemical vapor deposition) | ko |
| dc.type | Thesis | - |
| dc.contributor.department | 금속공학과 | - |
| dc.description.degree | Doctor | ko |
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