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불화탄소 플라즈마에서 벽면으로부터 반사된 이온과 바닥면으로부터 발생된 라디칼이 SiO₂의 식각 특성에 미치는 영향
Effects of ions reflected from the sidewall and radicals emitted from the bottom on the etch characteristics of SiO₂in a fluorocarbon plasma

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  • mendeley

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