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동시 스퍼터링법에 의한 강유전체 기억소자용 PZT와 BST 박막 제조 및 특성 향상에 관한 연구 : A Study on the fabrication and improvement of PZT and BST thin films for the ferroelectric memory devices by co-sputtering method

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dc.contributor.advisor주승기-
dc.contributor.author주재현-
dc.date.accessioned2010-02-05T06:44:21Z-
dc.date.available2010-02-05T06:44:21Z-
dc.date.copyright1996.-
dc.date.issued1996-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000081555kog
dc.identifier.urihttps://hdl.handle.net/10371/50872-
dc.description학위논문(박사)--서울대학교 대학원 :금속공학과,1996.ko
dc.format.extentxi, 137 장ko
dc.language.isokoko
dc.publisher서울대학교 대학원ko
dc.subject동시 스퍼터링ko
dc.subjectPZTko
dc.subject강유전체ko
dc.subjectBSTko
dc.subject기억소자ko
dc.subjectco-sputteringko
dc.subject상변태ko
dc.subjectferroelectricko
dc.subject전도기구ko
dc.subjectmemory deviceko
dc.title동시 스퍼터링법에 의한 강유전체 기억소자용 PZT와 BST 박막 제조 및 특성 향상에 관한 연구ko
dc.title.alternativeA Study on the fabrication and improvement of PZT and BST thin films for the ferroelectric memory devices by co-sputtering methodko
dc.typeThesis-
dc.contributor.department금속공학과-
dc.description.degreeDoctorko
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