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플라즈마 화학증착법을 이용한 (Ti[1-x]Al[x])N 박막의 제조 및 특성에 관한 연구 : Preparation and properties of the (Ti[1-x]Al[x])N coatings deposited by plasma enhanced chemical vapor deposition

DC Field Value Language
dc.contributor.advisor이정중-
dc.contributor.author이상협-
dc.date.accessioned2010-02-05T06:45:14Z-
dc.date.available2010-02-05T06:45:14Z-
dc.date.copyright1995.-
dc.date.issued1995-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000084671kog
dc.identifier.urihttps://hdl.handle.net/10371/50889-
dc.description학위논문(박사)--서울대학교 대학원 :금속공학과,1995.ko
dc.format.extentix, 115 장ko
dc.language.isokoko
dc.publisher서울대학교 대학원ko
dc.subject플라즈마 화학증착ko
dc.subjectTiAlNko
dc.subjectAlNko
dc.subject농도경사ko
dc.subject준안정상ko
dc.title플라즈마 화학증착법을 이용한 (Ti[1-x]Al[x])N 박막의 제조 및 특성에 관한 연구ko
dc.title.alternativePreparation and properties of the (Ti[1-x]Al[x])N coatings deposited by plasma enhanced chemical vapor depositionko
dc.typeThesis-
dc.contributor.department금속공학과-
dc.description.degreeDoctorko
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