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Surfactant-Assisted Orientation of Thin Diblock Copolymer Films

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dc.contributor.authorSon, Jeong Gon-
dc.contributor.authorBulliard, Xavier-
dc.contributor.authorKang, Huiman-
dc.contributor.authorNealey, Paul F.-
dc.contributor.authorChar, Kookheon-
dc.date.accessioned2009-07-16T03:08:46Z-
dc.date.available2009-07-16T03:08:46Z-
dc.date.issued2008-08-19-
dc.identifier.citationAdv. Mater. 2008, 20, 3643en
dc.identifier.issn0935-9648 (print)-
dc.identifier.issn1521-4095 (online)-
dc.identifier.urihttps://hdl.handle.net/10371/5655-
dc.description.abstractThe addition of surfactants, which preferentially interact with the PMMA block domains, modifies the surface energy of the system by making the surface energy difference between the two blocks almost equal, resulting in the perpendicular orientation of microphase separated domains in the film.en
dc.description.sponsorshipThis work was financially supported by the Korea Science and Engineering Foundation (KOSEF) grant through the Acceleration Research and the NANO Systems Institute - National Core Research Center funded by the Ministry of Science and Technology (R17-2007-059-01000-0 and R15-2003-032-02002-0), the Neutron Beam Research funded by the Ministry of Science and Technology (2007-00808), the Brain Korea 21 Program endorsed by the Ministry of Education of Korea and the Seoul Science Fellowship. Additional financial support of the Swiss National Foundation for Scientific Research (SNFS) for X.B. is acknowledged (PBEL2-110173). This work is also performed by the Collaborative Program of Nanoscale Science and Engineering Center of National Science Foundation (NSF) (DMR-0425880).en
dc.language.isoenen
dc.publisherWiley-Blackwellen
dc.subjectblock copolymer(s)en
dc.subjectdomain orientationen
dc.subjectself-assemblyen
dc.subjectsurfactant(s)en
dc.subjectthin film(s)en
dc.titleSurfactant-Assisted Orientation of Thin Diblock Copolymer Filmsen
dc.typeArticleen
dc.contributor.AlternativeAuthor손정곤-
dc.contributor.AlternativeAuthor강희만-
dc.contributor.AlternativeAuthor차국헌-
dc.identifier.doi10.1002/adma.200800670-
dc.citation.journaltitleAdvanced Materials-
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