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(A) study on the instability of porous low-k dielectric in cu interconnect : 다공성 저유전상수 물질의 열적 안정성 연구

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dc.contributor.advisor오규환-
dc.contributor.author강석훈-
dc.date.accessioned2010-05-04T04:46:36Z-
dc.date.available2010-05-04T04:46:36Z-
dc.date.copyright2010-
dc.date.issued2010-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000032457eng
dc.identifier.urihttps://hdl.handle.net/10371/63874-
dc.descriptionThesis(doctors) --서울대학교 대학원 :재료공학부,2010.2.en
dc.format.extentxi, 122 leavesen
dc.language.isoenen
dc.publisher서울대학교 대학원en
dc.subject저유전상수 물질en
dc.subjectporous low-k dielectric materialen
dc.subject구리 배선en
dc.subjectinterconnecten
dc.subject다공성en
dc.subjectporosityen
dc.subject열응력en
dc.subjectthermal stressen
dc.subject탄성계수en
dc.subjectYoungs modulusen
dc.subject열분해en
dc.subjectthermal decompositionen
dc.subject수축en
dc.subjectSiCOHen
dc.subject기공en
dc.subjectMSSQen
dc.subject구리 배선 밀도en
dc.subjectFTIRen
dc.subjectkineticsen
dc.subjectcontractionen
dc.subjectvoidingen
dc.subjectCu pattern densityen
dc.subjectblanket filmen
dc.subjectcross-linksen
dc.title(A) study on the instability of porous low-k dielectric in cu interconnecten
dc.title.alternative다공성 저유전상수 물질의 열적 안정성 연구en
dc.typeThesis-
dc.contributor.department재료공학부-
dc.description.degreeDoctoren
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