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Hf(O-iPr)4 전구체와 O2를 이용한 HfO2 박막의 원자층 증착
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 문상흡 | - |
| dc.contributor.author | 김정찬 | - |
| dc.date.accessioned | 2010-05-14T08:02:54Z | - |
| dc.date.available | 2010-05-14T08:02:54Z | - |
| dc.date.copyright | 2004. | - |
| dc.date.issued | 2004 | - |
| dc.identifier.uri | http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000055571 | kog |
| dc.identifier.uri | https://hdl.handle.net/10371/66376 | - |
| dc.description | 학위논문(석사)--서울대학교 대학원 :응용화학부,2004. | ko |
| dc.format.extent | vii, 60 장 | ko |
| dc.language.iso | ko | ko |
| dc.publisher | 서울대학교 대학원 | ko |
| dc.subject | 게이트 절연막 | ko |
| dc.subject | Gate dielectric | ko |
| dc.subject | 원자층 증착 | ko |
| dc.subject | Atomic layer deposition | ko |
| dc.subject | Hf(O-iPr)4 | ko |
| dc.subject | Hf(o-ipr)4 | ko |
| dc.subject | HfO2 | ko |
| dc.subject | Hfo2 | ko |
| dc.title | Hf(O-iPr)4 전구체와 O2를 이용한 HfO2 박막의 원자층 증착 | ko |
| dc.type | Thesis | - |
| dc.contributor.department | 응용화학부 | - |
| dc.description.degree | Master | ko |
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