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Hf(O-iPr)4 전구체와 O2를 이용한 HfO2 박막의 원자층 증착
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- Authors
- Advisor
- 문상흡
- Issue Date
- 2004
- Publisher
- 서울대학교 대학원
- Keywords
- 게이트 절연막 ; Gate dielectric ; 원자층 증착 ; Atomic layer deposition ; Hf(O-iPr)4 ; Hf(o-ipr)4 ; HfO2 ; Hfo2
- Description
- 학위논문(석사)--서울대학교 대학원 :응용화학부,2004.
- Language
- Korean
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000055571
https://hdl.handle.net/10371/66376
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