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Two-step filling in Cu electroless deposition using a concentration-dependent effect of 3-N,N-dimethylaminodithiocarbamoyl-1-propanesulfonic acid
Cited 8 time in
Web of Science
Cited 10 time in Scopus
- Authors
- Issue Date
- 2007-11-14
- Publisher
- Electrochemical Society
- Citation
- Electrochemical and Solid-state Letters, 11(1), D18-D21
- Abstract
- This paper describes electroless Cu filling of trenches with different widths ranging from 130 to 300 nm, using a concentrationdependent
effect of 3-N,N-dimethylaminodithiocarbamoyl-1-propanesulfonic acid DPS . With a fixed DPS concentration, it is
shown that these trenches with different dimensions cannot be superfilled simultaneously. This is presumably caused by different
surface concentrations of the adsorbed additive, which depends on the feature size and surface area. A two-step filling method is
employed to superfill those trenches, which is also effective in control of the deposited Cu amounts to obtain uniform growth front
regardless of the trench dimensions.
- ISSN
- 1099-0062
- Language
- English
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