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Monitoring trends of technological changes based on the dynamic patent lattice: A modified formal concept analysis approach

Cited 75 time in Web of Science Cited 85 time in Scopus
Authors

Lee, Changyong; Jeon, Jeonghwan; Park, Yongtae

Issue Date
2011-05-01
Publisher
ELSEVIER SCIENCE INC
Citation
TECHNOLOGICAL FORECASTING AND SOCIAL CHANGE; Vol.78 4; 690-702
Keywords
Technology monitoringPatent analysisFormal concept analysisTechnology intelligenceDynamic patent lattice
Abstract
The strategic importance of monitoring technological changes is highlighted given the ever faster pace and increasing complexity of technological innovation. In this respect, patent citation analysis has been the most frequently adopted tool among others. However, patent citation analysis is subject to certain drawbacks that stem from only consideration of citing-cited information and time lags between citing and cited patents. This study proposes a formal concept analysis (FCA)-based approach to developing a dynamic patent lattice that can analyze complex relations among patents and monitor trends of technological changes. The FCA is a mathematical tool for grouping objects with shared properties based on the lattice theory. The distinct strengths of FCA, vis-a-vis other methods, lie in structuring and displaying the relations among objects from a massive amount of data. For the purpose of technology monitoring, the FCA is modified to take into account time periods and changes of patent keywords. A patent context is first constructed with the aid of domain experts and text mining technique. Two types of dynamic patent lattices are then developed by executing the modified FCA algorithm. A case study of laser technology in lithography for semiconductor manufacturing shows that the suggested dynamic patent lattice has considerable advantages over conventional patent citation maps in terms of visualization and informative power. (C) 2010 Elsevier Inc. All rights reserved.
ISSN
0040-1625
Language
English
URI
https://hdl.handle.net/10371/74920
DOI
https://doi.org/10.1016/j.techfore.2010.11.010
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