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Intermixing Characteristics of Strained InGaAs/InGaAsP Multiple Quantum Well Structure Using Impurity-Free Vacancy Diffusion

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dc.contributor.authorPark, Jung Woo-
dc.contributor.authorKim, Hyun Soo-
dc.contributor.authorKim, Jung Soo-
dc.contributor.authorOh, Dae Kon-
dc.contributor.authorOh, Kwang Ryong-
dc.contributor.authorYeo, Deok Ho-
dc.contributor.authorKim, Sung June-
dc.date.accessioned2009-08-26T03:23:45Z-
dc.date.available2009-08-26T03:23:45Z-
dc.date.issued1999-11-
dc.identifier.citationJpn. J. Appl. Phys. 38 (1999) L1303en
dc.identifier.issn0021-4922 (print)-
dc.identifier.issn1347-4065 (online)-
dc.identifier.urihttps://hdl.handle.net/10371/7852-
dc.description.abstractThe quantum well intermixing of a strained InGaAs/InGaAsP multiple quantum well using an impurity-free vacancy diffusion technique has been studied. The bandgap wavelength of quantum well was changed by the intermixing from 1.55 µm band to 1.3 µm band with a wavelength shift of 237 nm. The transformation from a multiple quantum well structure to a homogeneous alloy was observed. The strain-enhanced intermixing rate and self-interdiffusion rate were observed.en
dc.language.isoenen
dc.publisherJapan Society of Applied Physicsen
dc.subjectphotonic integrated circuit (PIC)en
dc.subjectquantum well intermixing (QWI)en
dc.subjectquantum well disorderingen
dc.subjectimpurity-free vacancy diffusion (IFVD)en
dc.subjectInGaAs/InGaAsP quatum wellen
dc.titleIntermixing Characteristics of Strained InGaAs/InGaAsP Multiple Quantum Well Structure Using Impurity-Free Vacancy Diffusionen
dc.typeArticleen
dc.contributor.AlternativeAuthor박정우-
dc.contributor.AlternativeAuthor김현수-
dc.contributor.AlternativeAuthor김정수-
dc.contributor.AlternativeAuthor오대곤-
dc.contributor.AlternativeAuthor오광룡-
dc.contributor.AlternativeAuthor여덕호-
dc.contributor.AlternativeAuthor김성준-
dc.identifier.doi10.1143/JJAP.38.L1303-
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