Characteristics of Intermixed InGaAs/InGaAsP Multi-Quantum-Well Structure

Abstract

The intermixing of a InGaAs/InGaAsP multi-quantum-well (MQW) structure induced by SiO2 dielectric cap layer deposition and heat treatment was investigated. Photoluminescence experiments reveal a large blue shift of the effective bandgap for the intermixed quantum well. By secondary ion mass spectroscopy, the group III and V elements of a MQW are found to interdiffuse at a similar rate after the intermixing process. An optical waveguide was fabricated using intermixed material where a propagation loss reduction of 450 dB was recorded at a wavelength close to the original bandgap wavelength.