Browse

A Shielded Silicon Neural Probe for Higher Signal-to-Noise Ratio Performance

Cited 0 time in Web of Science Cited 0 time in Scopus
Authors
Song, Jong Keun; Oh, Seung Jae; Kim, Sung June
Issue Date
2003-10-17
Citation
6th Seoul National Univ. and Hokkaido Univ. Joint Symposium, Seoul, Korea, October 17, 2003
Keywords
silicon neural probeneural prosthesispower spectradensityMEMSneural recording
Abstract
This paper focuses on the design and fabrication of the
silicon neural probe with two improvements: the design of
process for improvement in fabrication yield and the
integration of ground layer for reduction of electromagnetic
noise. First, we have found that fabrication yield is
determined by wet-etch step for bulk micromachining on
back side of wafer. In order to improve fabrication yield, a
design of photo-mask is modified that all probes are linked
by micro tab located between probes and bars on the wafer.
The micro tab is used to hold probes on wafer during wetetch.
Second, the main advantage of the internal ground
layer located below conduction line contributes dramatic
reduction of electro-magnetic noise. To evaluate
improvement due to the use of internal grounding at
electrode level, we measured power spectral density (PSD)
of noise in recorded signal. The noise PSD is reduced from
-45dB to -100dB at 120Hz that one of dominant
frequencies came from external noises. These
improvements will contribute to development on advanced
neuroprosthetic devices using silicon neural probe.
Language
English
URI
https://hdl.handle.net/10371/9307
Files in This Item:
Appears in Collections:
College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Electrical and Computer Engineering (전기·정보공학부)Others_전기·정보공학부
  • mendeley

Items in S-Space are protected by copyright, with all rights reserved, unless otherwise indicated.

Browse