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Issue Date	Title / Author(s) / Citation	File	Altmetrics
2022-02	Phenomenology-based model predictive control of electron density in Ar/SF6 capacitively coupled etch plasma Ryu, Sangwon; Kwon, Ji-Won; Lee, Ingyu; Park, Jihoon; Kim, Gon-Ho Journal of the Korean Physical Society, Vol.80 No.3, pp.233-240	DOI