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Development of a novel plasma ion source with high brightness by biased extraction method : 바이어스 기법을 이용한 고휘도의 새로운 플라즈마 이온원 개발
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- Authors
- Advisor
- 황용석
- Issue Date
- 2006
- Publisher
- 서울대학교 대학원
- Keywords
- 고휘도 이온원 ; High brightness ion source ; 집속이온빔 ; Focused ion beam ; 이중층 ; Double layer ; 바어어스 전극 ; Localized discharge ; 국소방전 ; Bias electrode ; 플라즈마 접촉기 ; Plasma contactor ; 에미턴스 ; Emittance ; 유도결합 플라즈마 ; Particle-in-cell Monte-Carlo collision simulation ; Particle-in-cell Monte-Carlo Collision simulation. ; Inductively coupled plasma.
- Description
- Thesis(doctoral)--서울대학교 대학원 :원자핵공학과,2006.
- Language
- English
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000046442
https://hdl.handle.net/10371/12227
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