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Deposition behavior and dielectric properties of high dielectric constant oxide thin films : 고유전율 산화물 박막의 증착 거동 및 유전 특성

DC Field Value Language
dc.contributor.advisor김형준-
dc.contributor.author노상용-
dc.date.accessioned2009-11-18-
dc.date.available2009-11-18-
dc.date.copyright2006.-
dc.date.issued2006-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000046482eng
dc.identifier.urihttps://hdl.handle.net/10371/12648-
dc.descriptionThesis(doctoral)--서울대학교 대학원 :재료공학부,2006.eng
dc.format.extentxvi, 197 p.eng
dc.language.isoeneng
dc.publisher서울대학교 대학원eng
dc.subjecthigh-κeng
dc.subjecthigh-κeng
dc.subjectMOCVDeng
dc.subjectMOCVDeng
dc.subjectALDeng
dc.subjectALDeng
dc.subjectTiO2eng
dc.subjectTiO2eng
dc.subjectAl2O3eng
dc.subjectAl2O3eng
dc.subjectAlNeng
dc.subjectAlNeng
dc.subjectLa2O3eng
dc.subjectLa2O3eng
dc.subject증착거동eng
dc.subjectdeposition behavioreng
dc.subject누설전류eng
dc.subjectleakage current mechanismeng
dc.subject밴드갭eng
dc.subjectband gapeng
dc.subjectXPSeng
dc.subjectXPSeng
dc.subject계면트랩밀도eng
dc.subjectinterface trap densityeng
dc.titleDeposition behavior and dielectric properties of high dielectric constant oxide thin filmseng
dc.title.alternative고유전율 산화물 박막의 증착 거동 및 유전 특성eng
dc.typeThesis-
dc.contributor.department재료공학부-
dc.description.degreeDoctoreng
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