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Photo-triggered Destructible Ultra-thin Flexible Resistive Random Access Memory : 빛으로 파괴 가능한 매우 얇고 휘어지는 저항메모리

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dc.contributor.advisor김대형-
dc.contributor.author이학용-
dc.date.accessioned2017-07-19T05:57:20Z-
dc.date.available2019-04-17-
dc.date.issued2016-02-
dc.identifier.other000000132630-
dc.identifier.urihttps://hdl.handle.net/10371/129411-
dc.description학위논문 (석사)-- 서울대학교 대학원 : 화학생물공학부, 2016. 2. 김대형.-
dc.description.abstractFlexible memories for the Internet of things (IoT) have attracted great attention due to its wide applicability to various items such as healthcare electronic patches. However, they are prone to be hacked by unauthorized access when it is lost, although they store important personal identification data. Therefore, memory devices should be able to be physically destructed on demand by certain triggers while having large data storage. Here, I propose a photo-triggered destructible flexible resistive memory of which fabrication process is suitable to the conventional one so that it can be fabricated on a high density transistor array. Poly ethylene oxide film containing photo acid generator molecules was coated on the resistive memory. The top electrode and the resistance switching layer of the memory are made of Mg and Mn doped ZnO (3 wt%), respectively, which dissolve under acidic conditions. This intrinsic nature of Mg and ZnO:Mn and ultrathin thickness of the ZnO:Mn layer helped complete erase of the stored data in the memory device when ultraviolet light is illuminated on it. This system enables a novel technology of IoT with information security and large data storage.-
dc.description.tableofcontents1. Introduction 1

2. Ultra-thin non-volatile resistive memory 5
2.1. Structure and electrical characteristics of the resistive memory 5
2.2. Resistance switching mechanism of the resistive memory 10
2.3. The resistive memory in a flexible form 15

3. Photo-induced destruction of the resistive memory 17
3.1. Acid generation in the acid generating layer 17
3.2. Dissolution of Mg thin film under UV illuminated acid generating layer 20
3.3. Dissolution of ZnO:Mn thin film under UV illuminated acid generating layer 28
3.4. Destruction of the resistive memory under UV illuminated acid generating layer 31

4. The resistive memory on a single crystal silicon nano-membrane transistor array 34
4.1. The resistive memory on the single crystal silicon nano-membrane transistor 34
4.2. Erase of data stored in the resistive memory on the transistor array 38

5. Experimental Section 41
5.1. Materials for device fabrication 41
5.2. Fabrication of the destructible memory 41
5.3. Endurance and retention behavior test of the destructible memory 42
5.4. Fabrication of flexible memory 43
5.5. Fabrication of the single crystal silicon nano-membrane transistor 43
5.6. Experimental equipments 44

6. Conclusion 45

7. Reference 46

요약 (국문 초록) 48
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dc.formatapplication/pdf-
dc.format.extent2715145 bytes-
dc.format.mediumapplication/pdf-
dc.language.isoen-
dc.publisher서울대학교 대학원-
dc.subject휘어지는 메모리-
dc.subject.ddc660-
dc.titlePhoto-triggered Destructible Ultra-thin Flexible Resistive Random Access Memory-
dc.title.alternative빛으로 파괴 가능한 매우 얇고 휘어지는 저항메모리-
dc.typeThesis-
dc.contributor.AlternativeAuthorHakyong Lee-
dc.description.degreeMaster-
dc.citation.pages48-
dc.contributor.affiliation공과대학 화학생물공학부-
dc.date.awarded2016-02-
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