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Property improvement of the Ruthenium thin films deposited by metal-organic chemical vapor deposition for the electrodes of the DRAM devices : DRAM 소자의 전극 물질로의 적용을 위해 유기화학기상 증착법으로 증착한 Ru 박막의 특성 개선에 관한 연구
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 김형준 | - |
| dc.contributor.author | 김범석 | - |
| dc.date.accessioned | 2009-11-18T06:19:01Z | - |
| dc.date.available | 2009-11-18T06:19:01Z | - |
| dc.date.copyright | 2008. | - |
| dc.date.issued | 2008 | - |
| dc.identifier.uri | http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000039488 | eng |
| dc.identifier.uri | https://hdl.handle.net/10371/13208 | - |
| dc.description | Thesis(doctors) --서울대학교 대학원 :재료공학부, 2008.2. | eng |
| dc.format.extent | xv, 156 p. | eng |
| dc.language.iso | en | - |
| dc.publisher | 서울대학교 대학원 | eng |
| dc.subject | Ru | eng |
| dc.subject | Ru | eng |
| dc.subject | 유기금속화학기상증착 | eng |
| dc.subject | MOCVD | eng |
| dc.subject | DRAM | eng |
| dc.subject | DRAM | eng |
| dc.subject | 핵생성 | eng |
| dc.subject | nucleation | eng |
| dc.subject | 일함수 | eng |
| dc.subject | work function | eng |
| dc.subject | agglomeration | eng |
| dc.subject | agglomeration | eng |
| dc.title | Property improvement of the Ruthenium thin films deposited by metal-organic chemical vapor deposition for the electrodes of the DRAM devices | eng |
| dc.title.alternative | DRAM 소자의 전극 물질로의 적용을 위해 유기화학기상 증착법으로 증착한 Ru 박막의 특성 개선에 관한 연구 | eng |
| dc.type | Thesis | - |
| dc.contributor.department | 재료공학부 | - |
| dc.description.degree | Doctor | eng |
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