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(A)Study on the reduction of the leakage current in MILC Poly-Si TFT : 금속유도측면결정화에 의한 다결정질 실리콘 박막 트랜지스터의 누설 전류 감소에관한 연구
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 주승기 | - |
| dc.contributor.author | 한신희 | - |
| dc.date.accessioned | 2009-11-18T22:18:25Z | - |
| dc.date.available | 2009-11-18T22:18:25Z | - |
| dc.date.copyright | 2007. | - |
| dc.date.issued | 2007 | - |
| dc.identifier.uri | http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000045090 | eng |
| dc.identifier.uri | https://hdl.handle.net/10371/13512 | - |
| dc.description | Thesis(doctor`s)--서울대학교 대학원 :재료공학부,2007. | eng |
| dc.format.extent | xiv, 108 p. | eng |
| dc.language.iso | en | eng |
| dc.publisher | 서울대학교 대학원 | eng |
| dc.subject | 금속유도측면결정화 (MILC) | eng |
| dc.subject | metal-induced lateral crystallization (MILC) | eng |
| dc.subject | 다결정질 실리콘 (poly-Si) | eng |
| dc.subject | polycrystalline silicon (poly-Si) | eng |
| dc.subject | 전기적 스트레스 (Electrical Stressing) | eng |
| dc.subject | Leakage current | eng |
| dc.subject | 박막 트랜지스터 (TFT) | eng |
| dc.subject | Electrical Stressing | eng |
| dc.subject | 수소 열처리 | eng |
| dc.subject | thin film transistor (TFT) | eng |
| dc.subject | gate-overlapped Lightly Doped Drain (GOLDD) | eng |
| dc.subject | H2 annealing | eng |
| dc.subject | Gate-Overlapped Lightly Doped Drain (GOLDD) | eng |
| dc.title | (A)Study on the reduction of the leakage current in MILC Poly-Si TFT | eng |
| dc.title.alternative | 금속유도측면결정화에 의한 다결정질 실리콘 박막 트랜지스터의 누설 전류 감소에관한 연구 | eng |
| dc.type | Thesis | - |
| dc.contributor.department | 재료공학부 | - |
| dc.description.degree | Doctor | eng |
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