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Homoepitaxial growth and In-situ doping of monocrystalline 4H-SiC for power device applications

DC Field Value Language
dc.contributor.advisor김형준-
dc.contributor.author송호근-
dc.date.accessioned2009-11-18T22:27:49Z-
dc.date.available2009-11-18T22:27:49Z-
dc.date.copyright2007.-
dc.date.issued2007-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000042908eng
dc.identifier.urihttps://hdl.handle.net/10371/13534-
dc.description학위논문(박사)--서울대학교 대학원 :재료공학부,2007.eng
dc.format.extentxix, 236 p.eng
dc.language.isoeneng
dc.publisher서울대학교 대학원eng
dc.subject4H-SiCeng
dc.subject4H-SiCeng
dc.subjectHomoepitaxial growtheng
dc.subjectHomoepitaxial growtheng
dc.subjectBTMSMeng
dc.subjectBTMSMeng
dc.subjectSemi-insulatingeng
dc.subjectSemi-insulatingeng
dc.subjecteng
dc.subjectFeeng
dc.subject바나듐eng
dc.subjectVanadiumeng
dc.subjectPorous SiC 기판eng
dc.subjectPorous SiC substrateeng
dc.subjectSchottky barrier diodeeng
dc.subjectSchottky barrier diodeeng
dc.titleHomoepitaxial growth and In-situ doping of monocrystalline 4H-SiC for power device applicationseng
dc.typeThesis-
dc.contributor.department재료공학부-
dc.description.degreeDoctoreng
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