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저온?고속증착을 위해 고안된 스퍼터링 공정 및 제조된 광촉매성 TiO₂ 박막의 특성 연구 : Low temperature TiO2 deposition by reactive ICP-sputtering and the photo-catalytic ability of TiO2
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 이정중 | - |
| dc.contributor.author | 한영훈 | - |
| dc.date.accessioned | 2009-11-18T22:49:29Z | - |
| dc.date.available | 2009-11-18T22:49:29Z | - |
| dc.date.copyright | 2007. | - |
| dc.date.issued | 2007 | - |
| dc.identifier.uri | http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000042919 | kor |
| dc.identifier.uri | https://hdl.handle.net/10371/13588 | - |
| dc.description | 학위논문(박사) --서울대학교 대학원 :재료공학부,2007. | kor |
| dc.format.extent | 105 장 | kor |
| dc.language.iso | ko | kor |
| dc.publisher | 서울대학교 대학원 | kor |
| dc.subject | TiO2 | kor |
| dc.subject | TiO2 | kor |
| dc.subject | 광촉매 | kor |
| dc.subject | photo-catalytic | kor |
| dc.subject | 반응성 스퍼터링 | kor |
| dc.subject | Reactive sputtering | kor |
| dc.subject | 유도결합플라즈마 | kor |
| dc.subject | Target voltage control | kor |
| dc.subject | high deposition rate | kor |
| dc.subject | Inductively coupled plasma | kor |
| dc.subject | low temperature deposition | kor |
| dc.title | 저온?고속증착을 위해 고안된 스퍼터링 공정 및 제조된 광촉매성 TiO₂ 박막의 특성 연구 | kor |
| dc.title.alternative | Low temperature TiO2 deposition by reactive ICP-sputtering and the photo-catalytic ability of TiO2 | kor |
| dc.type | Thesis | - |
| dc.contributor.department | 재료공학부 | - |
| dc.description.degree | Doctor | kor |
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