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ULSI용 구리배선에서의 도금공정 및 전기화학적 특성 분석 : A study on the electroplating process and electrochemical characteristics for Cu interconnect

DC Field Value Language
dc.contributor.advisor강탁-
dc.contributor.author이의형-
dc.date.accessioned2009-11-18T22:51:21Z-
dc.date.available2009-11-18T22:51:21Z-
dc.date.copyright2007.-
dc.date.issued2007-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000042934kor
dc.identifier.urihttps://hdl.handle.net/10371/13593-
dc.description학위논문(박사) --서울대학교 대학원 :재료공학부,2007.kor
dc.format.extentxii, 128 장kor
dc.language.isokokor
dc.publisher서울대학교 대학원kor
dc.subject도금kor
dc.subjectelectroplatingkor
dc.subjectdamascenekor
dc.subjectdamascenekor
dc.subjectsuperfillingkor
dc.subjectsuperfillingkor
dc.subject유기 첨가제kor
dc.subjectadditiveskor
dc.subject부식kor
dc.subjectcorrosionkor
dc.subjectself annealkor
dc.subjectself annealkor
dc.titleULSI용 구리배선에서의 도금공정 및 전기화학적 특성 분석kor
dc.title.alternativeA study on the electroplating process and electrochemical characteristics for Cu interconnectkor
dc.typeThesis-
dc.contributor.department재료공학부-
dc.description.degreeDoctorkor
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