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Electrical conduction mechanisms in HfO2 films grown by atomic layer deposition : 산화물 박막의 전기 전도 기구에 관한 연구

DC Field Value Language
dc.contributor.advisor황철성-
dc.contributor.author정두석-
dc.date.accessioned2009-11-24T03:19:52Z-
dc.date.available2009-11-24T03:19:52Z-
dc.date.copyright2005.-
dc.date.issued2005-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000051027eng
dc.identifier.urihttps://hdl.handle.net/10371/14326-
dc.descriptionThesis(master`s)--서울대학교 대학원 :재료공학부,2005.eng
dc.format.extentx, 96 leaveseng
dc.language.isoen-
dc.publisher서울대학교 대학원eng
dc.subject전기 전도 기구eng
dc.subjectHfO2eng
dc.subjectPoole-Frenkel conduction mechanismeng
dc.subjectBardeen tunneling-Hamiltonian formalismeng
dc.titleElectrical conduction mechanisms in HfO2 films grown by atomic layer depositioneng
dc.title.alternative산화물 박막의 전기 전도 기구에 관한 연구eng
dc.typeThesis-
dc.contributor.department재료공학부-
dc.description.degreeMastereng
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