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유도 결합 플라즈마(ICP) 스퍼터링법에 의한 투명 전도성 ITO 박막의 저온 증착 : Low temperature deposition of transparent conducting ITO films by Inductively Coupled Plasma-assisted DC magnetron sputtering

DC Field Value Language
dc.contributor.advisor이정중-
dc.contributor.author구범모-
dc.date.accessioned2009-11-24T03:25:58Z-
dc.date.available2009-11-24T03:25:58Z-
dc.date.copyright2005.-
dc.date.issued2005-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000051028kor
dc.identifier.urihttps://hdl.handle.net/10371/14345-
dc.description학위논문(석사)--서울대학교 대학원 :재료공학부,2005.kor
dc.format.extentiii, 43 장kor
dc.language.isokokor
dc.publisher서울대학교 대학원kor
dc.subjectIndium tin oxide(ITO)kor
dc.subjectIndium tin oxide(ITO)kor
dc.subject유도결합 플라즈마(ICP)kor
dc.subjectInductively coupled plasma(ICP)kor
dc.subject마그네트론 스퍼터링kor
dc.subjectsputteringkor
dc.title유도 결합 플라즈마(ICP) 스퍼터링법에 의한 투명 전도성 ITO 박막의 저온 증착kor
dc.title.alternativeLow temperature deposition of transparent conducting ITO films by Inductively Coupled Plasma-assisted DC magnetron sputteringkor
dc.typeThesis-
dc.contributor.department재료공학부-
dc.description.degreeMasterkor
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