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DRAM에 응용되는 이산화티타늄을 기반으로 한 산화박막의 증착거동 및 유전특성 개선에 관한 연구 : Improvements in deposition behavior and dielectric properties of TiO2 based oxide films for dynamic random access memory applications
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- Authors
- Advisor
- 황철성
- Issue Date
- 2009
- Publisher
- 서울대학교 대학원
- Keywords
- 커패시터 ; capacitor ; ALD ; ALD ; PEALD ; PEALD ; TiO2 ; TiO2 ; Al-doped TiO2 ; Al-doped TiO2 ; 플라즈마 ; plasma ; Ru ; Ru ; TiN ; TiN
- Description
- 학위논문(석사) --서울대학교 대학원 :재료공학부, 2009.2.
- Language
- Korean
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000036889
https://hdl.handle.net/10371/14967
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