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Antireflection Behavior of Multidimensional Nanostructures Patterned Using a Conformable Elastomeric Phase Mask in a Single Exposure Step
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Park, Junyong | - |
dc.contributor.author | Yoon, Sanghoon | - |
dc.contributor.author | Kang, Kisuk | - |
dc.contributor.author | Jeon, Seokwoo | - |
dc.date.accessioned | 2020-04-25T08:24:15Z | - |
dc.date.available | 2020-04-25T08:24:15Z | - |
dc.date.created | 2020-03-20 | - |
dc.date.issued | 2010-09 | - |
dc.identifier.citation | Small, Vol.6 No.18, pp.1981-1985 | - |
dc.identifier.issn | 1613-6810 | - |
dc.identifier.other | 92931 | - |
dc.identifier.uri | https://hdl.handle.net/10371/165177 | - |
dc.language | 영어 | - |
dc.publisher | Wiley - V C H Verlag GmbbH & Co. | - |
dc.title | Antireflection Behavior of Multidimensional Nanostructures Patterned Using a Conformable Elastomeric Phase Mask in a Single Exposure Step | - |
dc.type | Article | - |
dc.contributor.AlternativeAuthor | 강기석 | - |
dc.identifier.doi | 10.1002/smll.201000275 | - |
dc.citation.journaltitle | Small | - |
dc.identifier.wosid | 000282664800004 | - |
dc.identifier.scopusid | 2-s2.0-77956910216 | - |
dc.citation.endpage | 1985 | - |
dc.citation.number | 18 | - |
dc.citation.startpage | 1981 | - |
dc.citation.volume | 6 | - |
dc.identifier.sci | 000282664800004 | - |
dc.description.isOpenAccess | N | - |
dc.contributor.affiliatedAuthor | Kang, Kisuk | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.subject.keywordPlus | BROAD-BAND | - |
dc.subject.keywordPlus | STRUCTURED SURFACES | - |
dc.subject.keywordPlus | FILMS | - |
dc.subject.keywordPlus | REFLECTION | - |
dc.subject.keywordPlus | REDUCTION | - |
dc.subject.keywordPlus | GRATINGS | - |
dc.subject.keywordPlus | COATINGS | - |
dc.subject.keywordPlus | LAYERS | - |
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