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Degradation of tetramethylammonium hydroxide (TMAH) during UV-LED/H2O2 reaction: Degassing effect, radical contribution, and degradation mechanism
DC Field | Value | Language |
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dc.contributor.author | Kim, Tae-Kyoung | - |
dc.contributor.author | Lee, Donghyun | - |
dc.contributor.author | Lee, Changha | - |
dc.contributor.author | Hwang, Yu Sik | - |
dc.contributor.author | Zoh, Kyung-Duk | - |
dc.date.accessioned | 2022-10-11T01:09:29Z | - |
dc.date.available | 2022-10-11T01:09:29Z | - |
dc.date.created | 2022-09-29 | - |
dc.date.created | 2022-09-29 | - |
dc.date.created | 2022-09-29 | - |
dc.date.created | 2022-09-29 | - |
dc.date.created | 2022-09-29 | - |
dc.date.created | 2022-09-29 | - |
dc.date.created | 2022-09-29 | - |
dc.date.created | 2022-09-29 | - |
dc.date.created | 2022-09-29 | - |
dc.date.created | 2022-09-29 | - |
dc.date.issued | 2022-10 | - |
dc.identifier.citation | Journal of Hazardous Materials, Vol.440, p. 129781 | - |
dc.identifier.issn | 0304-3894 | - |
dc.identifier.uri | https://hdl.handle.net/10371/185702 | - |
dc.description.abstract | © 2022 Elsevier B.V.Semiconductor wastewater usually has a low level of dissolved oxygen and alcohol because ultra-pure water used in the process undergoes rigorous degassing and wafer development, respectively. In this study, we investigated the degradation mechanism of tetramethylammonium hydroxide (TMAH), a compound of concern in the semiconductor manufacturing process, during the UV-LED/H2O2 under initial nitrogen purging conditions to remove dissolved oxygen. The effect of the initial degassing was negligible due to the in-situ O2 production during the reaction. Along with hydroxyl radical (•OH), we first observed hydrated electron (eaq•-) formation by electron paramagnetic resonance (EPR) analysis in the presence of an excessive amount of tertiary butanol (t-BuOH), •OH scavenger, during the UV-LED/H2O2 reaction. However, the contribution of eaq•- on TMAH degradation was negligible compared to •OH which played a major role in TMAH degradation. The calculated reaction rate constant of TMAH with •OH was 7.5 × 107 M−1 s−1. From competitive kinetics, [•OH]ss and k •OH, TMAH value was found to be 7.1 × 10−13 M and 7.5 × 107 M−1 s−1, respectively. The optimum pH and temperature for TMAH degradation were pH 7 and 35 °C. Three demethylated amines (trimethylamine, dimethylamine, and methylamine), along with NH4+ and NO3- ions, were detected as the byproducts, implying that the main degradation mechanism of TMAH in this reaction is H abstraction by •OH-induced oxidation and hydrolysis resulting from the •OH-induced oxidation, and demethylation. Our result implies that the UV-LED/H2O2 reaction can be one of the options to treat TMAH contaminated water by recycling H2O2 produced in the semiconductor manufacturing process and lowering the energy consumption by using UV-LED. | - |
dc.language | 영어 | - |
dc.publisher | Elsevier BV | - |
dc.title | Degradation of tetramethylammonium hydroxide (TMAH) during UV-LED/H2O2 reaction: Degassing effect, radical contribution, and degradation mechanism | - |
dc.type | Article | - |
dc.identifier.doi | 10.1016/j.jhazmat.2022.129781 | - |
dc.citation.journaltitle | Journal of Hazardous Materials | - |
dc.identifier.wosid | 000861025800002 | - |
dc.identifier.scopusid | 2-s2.0-85136560895 | - |
dc.citation.startpage | 129781 | - |
dc.citation.volume | 440 | - |
dc.description.isOpenAccess | N | - |
dc.contributor.affiliatedAuthor | Lee, Changha | - |
dc.contributor.affiliatedAuthor | Zoh, Kyung-Duk | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.subject.keywordPlus | OXIDATIVE-DEGRADATION | - |
dc.subject.keywordPlus | AQUEOUS-SOLUTION | - |
dc.subject.keywordPlus | DERMAL EXPOSURE | - |
dc.subject.keywordPlus | RATE CONSTANTS | - |
dc.subject.keywordPlus | WATER | - |
dc.subject.keywordPlus | TOXICITY | - |
dc.subject.keywordPlus | OH | - |
dc.subject.keywordPlus | KINETICS | - |
dc.subject.keywordPlus | ZEOLITE | - |
dc.subject.keywordPlus | CATION | - |
dc.subject.keywordAuthor | Hydrated electron | - |
dc.subject.keywordAuthor | OH radical | - |
dc.subject.keywordAuthor | Semiconductor wastewater | - |
dc.subject.keywordAuthor | TMAH | - |
dc.subject.keywordAuthor | Toxicity | - |
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