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W-band low-noise amplifier with 50 nm In0.8GaP/In0.4AlAs/In0.35GaAs metamorphic HEMT

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Authors

Kim, S.-W.; Koh, Y.-M.; Choi, W.-Y.; Kim, H.-T.; Kwon, Y.-W.; Seo, K.-S.

Issue Date
2008
Publisher
IEEE
Citation
Conference Proceedings - International Conference on Indium Phosphide and Related Materials, pp.213-215
Abstract
W-band low-noise amplifier (LNA) has been successfully demonstrated with 50 nm metamorphic HEMT (MHEMT) technologies. 50 nm MHEMT showed a g m.max of 760 mS/mm, a fT of 216 GHz, and a fmax of 400 GHz in spite of indium content of 35 % in the channel. W-band LNA with three-stage showed the small signal gain of 9.4 ± 1.8 dB from 40 GHz to 110 GHz. These results are well suited for high frequency applications.
ISSN
1092-8669
URI
https://hdl.handle.net/10371/200021
DOI
https://doi.org/10.1109/ICIPRM.2008.4702951
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  • College of Engineering
  • Department of Electrical and Computer Engineering
Research Area High Frequency Microelectronics, Microwave engineering, Radio Frequency Integrated Circuit, 초고주파 공학, 초고주파 시스템, 초고주파 집적회로

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