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Analytical threshold voltage model for double-gate MOSFETs with localized charges

Cited 43 time in Web of Science Cited 50 time in Scopus
Authors

Kang, Hongki; Han, Jin-Woo; Choi, Yang-Kyu

Issue Date
2008-08
Publisher
Institute of Electrical and Electronics Engineers
Citation
IEEE Electron Device Letters, Vol.29 No.8, pp.927-930
Abstract
An analytical threshold voltage model for double-gate MOSFETs with localized charges is developed. From the 2-D Poisson's equation with parabolic potential approximation, a compact threshold voltage model is derived. The proposed model is then verified with a 2-D device simulator. The model can be used to investigate hot-carrier-induced device degradation for various device dimensions and various charge distributions.
ISSN
0741-3106
URI
https://hdl.handle.net/10371/203136
DOI
https://doi.org/10.1109/LED.2008.2000965
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