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Deposition and characterization of low-dielectric-constant SiOC thin films for interlayer dielectrics of multilevel interconnection

DC Field Value Language
dc.contributor.advisor김형준-
dc.contributor.author김윤해-
dc.date.accessioned2010-01-17T02:13:11Z-
dc.date.available2010-01-17T02:13:11Z-
dc.date.copyright2002.-
dc.date.issued2002-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000060883eng
dc.identifier.urihttp://hdl.handle.net/10371/35426-
dc.descriptionThesis (doctoral)--서울대학교 대학원 :재료공학부,2002.en
dc.format.extentxxii, 165 leavesen
dc.language.isoenen
dc.publisher서울대학교 대학원en
dc.subjectinterconnectionen
dc.subject배선en
dc.subjectinterlayer dielectric(ILD)en
dc.subject층간 절연막en
dc.subjectcpapcitanceen
dc.subject정전용량en
dc.subjectdielectric constanten
dc.subject유전상수en
dc.subjectRC delayen
dc.subject신호지연en
dc.subjectlow dielectric constanten
dc.titleDeposition and characterization of low-dielectric-constant SiOC thin films for interlayer dielectrics of multilevel interconnectionen
dc.typeThesis-
dc.contributor.department재료공학부-
dc.description.degreeDoctoren
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College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Material Science and Engineering (재료공학부) Theses (Ph.D. / Sc.D._재료공학부)
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