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Study on etching characteristics and mechanism using the blower type atmospheric pressure plasma

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dc.contributor.advisor김곤호-
dc.contributor.author권호철-
dc.date.accessioned2010-01-25T23:34:59Z-
dc.date.available2010-01-25T23:34:59Z-
dc.date.copyright2008.-
dc.date.issued2008-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000039731eng
dc.identifier.urihttps://hdl.handle.net/10371/44228-
dc.description학위논문(석사) --서울대학교 대학원 :에너지시스템공학부,2008.2.en
dc.format.extentx, 68 leaves.en
dc.language.isoenen
dc.publisher서울대학교 대학원en
dc.subject분사형en
dc.subjectblower type atmospheric pressure plasmaen
dc.subject대기압 플라즈마en
dc.subjectatmospheric pressure plasmaen
dc.subject유전체 격벽 플라즈마en
dc.subjectdielectric barrier dischargeen
dc.subject비정질 실리콘en
dc.subjectchemically active speciesen
dc.subject비정질 실리콘 식각en
dc.subjectamorphous silicon (a-Si)en
dc.subject식각 공정en
dc.subjecta-Si etchingen
dc.subject식각 반응en
dc.subjectetching processen
dc.subjectTFT-LCDen
dc.subjecteffective reaction timeen
dc.subject대기압 플라즈마en
dc.subjectTFT-LCDen
dc.titleStudy on etching characteristics and mechanism using the blower type atmospheric pressure plasmaen
dc.typeThesis-
dc.contributor.department에너지시스템공학부-
dc.description.degreeMasteren
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