Publications
Detailed Information
Study on etching characteristics and mechanism using the blower type atmospheric pressure plasma
DC Field | Value | Language |
---|---|---|
dc.contributor.advisor | 김곤호 | - |
dc.contributor.author | 권호철 | - |
dc.date.accessioned | 2010-01-25T23:34:59Z | - |
dc.date.available | 2010-01-25T23:34:59Z | - |
dc.date.copyright | 2008. | - |
dc.date.issued | 2008 | - |
dc.identifier.uri | http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000039731 | eng |
dc.identifier.uri | https://hdl.handle.net/10371/44228 | - |
dc.description | 학위논문(석사) --서울대학교 대학원 :에너지시스템공학부,2008.2. | en |
dc.format.extent | x, 68 leaves. | en |
dc.language.iso | en | en |
dc.publisher | 서울대학교 대학원 | en |
dc.subject | 분사형 | en |
dc.subject | blower type atmospheric pressure plasma | en |
dc.subject | 대기압 플라즈마 | en |
dc.subject | atmospheric pressure plasma | en |
dc.subject | 유전체 격벽 플라즈마 | en |
dc.subject | dielectric barrier discharge | en |
dc.subject | 비정질 실리콘 | en |
dc.subject | chemically active species | en |
dc.subject | 비정질 실리콘 식각 | en |
dc.subject | amorphous silicon (a-Si) | en |
dc.subject | 식각 공정 | en |
dc.subject | a-Si etching | en |
dc.subject | 식각 반응 | en |
dc.subject | etching process | en |
dc.subject | TFT-LCD | en |
dc.subject | effective reaction time | en |
dc.subject | 대기압 플라즈마 | en |
dc.subject | TFT-LCD | en |
dc.title | Study on etching characteristics and mechanism using the blower type atmospheric pressure plasma | en |
dc.type | Thesis | - |
dc.contributor.department | 에너지시스템공학부 | - |
dc.description.degree | Master | en |
- Appears in Collections:
- Files in This Item:
- There are no files associated with this item.
Item View & Download Count
Items in S-Space are protected by copyright, with all rights reserved, unless otherwise indicated.