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연속체 가정을 통한 나노 임프린트 리소그래피 공정 해석

DC Field Value Language
dc.contributor.advisor이우일-
dc.contributor.author정장희-
dc.date.accessioned2010-01-26T03:51:52Z-
dc.date.available2010-01-26T03:51:52Z-
dc.date.copyright2004.-
dc.date.issued2004-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000056274kog
dc.identifier.urihttps://hdl.handle.net/10371/44465-
dc.description학위논문(석사)--서울대학교 대학원 :기계항공공학부,2004.ko
dc.format.extent45 장ko
dc.language.isokoko
dc.publisher서울대학교 대학원ko
dc.subject나노 임프린트 리소그래피(NIL)ko
dc.subjectNano-imprint-lithographyko
dc.subject수치해석ko
dc.subjectNumerical simulationko
dc.subject표면 장력ko
dc.subjectSurface tensionko
dc.subject접촉각ko
dc.subjectContact angleko
dc.subject슬립(slip)ko
dc.subjectSlipko
dc.subject핫엠보싱(hot-embossing)ko
dc.subjectHot-embossing experimentko
dc.title연속체 가정을 통한 나노 임프린트 리소그래피 공정 해석ko
dc.typeThesis-
dc.contributor.department기계항공공학부-
dc.description.degreeMasterko
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