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불화탄소 플라즈마에 의한 저유전율 박막의 식각 특성 : Etch characteristics of low dielectric constant materials in fluorocarbon plasmas
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 문상흡 | - |
| dc.contributor.author | 황성욱 | - |
| dc.date.accessioned | 2010-01-27 | - |
| dc.date.available | 2010-01-27 | - |
| dc.date.copyright | 2003. | - |
| dc.date.issued | 2003 | - |
| dc.identifier.uri | http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000058226 | kog |
| dc.identifier.uri | https://hdl.handle.net/10371/45265 | - |
| dc.description | 학위논문(박사)--서울대학교 대학원 :응용화학부,2003. | ko |
| dc.format.extent | viii, 104 장 | ko |
| dc.language.iso | ko | ko |
| dc.publisher | 서울대학교 대학원 | ko |
| dc.subject | 저유전율 물질 | ko |
| dc.subject | Silsesquioxane | ko |
| dc.subject | 불화탄소 플라즈마 | ko |
| dc.subject | 식각 반응 기구 | ko |
| dc.subject | 각도 의존성 | ko |
| dc.subject | 벽면 거칠기 | ko |
| dc.subject | O2 RIE | ko |
| dc.subject | 회분화 공정 | ko |
| dc.title | 불화탄소 플라즈마에 의한 저유전율 박막의 식각 특성 | ko |
| dc.title.alternative | Etch characteristics of low dielectric constant materials in fluorocarbon plasmas | ko |
| dc.type | Thesis | - |
| dc.contributor.department | 응용화학부 | - |
| dc.description.degree | Doctor | ko |
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