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Stress gradient relaxation and property modification of polysilicon films by ion implantation
DC Field | Value | Language |
---|---|---|
dc.contributor.advisor | 김용협 | - |
dc.contributor.author | 석지원 | - |
dc.date.accessioned | 2010-01-27T15:20:42Z | - |
dc.date.available | 2010-01-27T15:20:42Z | - |
dc.date.copyright | 2003. | - |
dc.date.issued | 2003 | - |
dc.identifier.uri | http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000059897 | eng |
dc.identifier.uri | https://hdl.handle.net/10371/45649 | - |
dc.description | Thesis (master`s)--서울대학교 대학원 :기계항공공학부,2003. | en |
dc.format.extent | viii, 44 leaves | en |
dc.language.iso | en | en |
dc.publisher | 서울대학교 대학원 | en |
dc.subject | MEMS | en |
dc.subject | Mems | en |
dc.subject | 이온 주입 | en |
dc.subject | Ion implantation | en |
dc.subject | 응력 구배 | en |
dc.subject | Stress gradient | en |
dc.subject | 다결정 실리콘 | en |
dc.subject | Polysilicon | en |
dc.subject | 표면 미세 가공 | en |
dc.subject | Surface micromachining | en |
dc.subject | 비결정질 실리콘 | en |
dc.subject | Amorphous silicon | en |
dc.subject | nano-indentation | en |
dc.subject | Nano-indentation | en |
dc.subject | 탄성계수 | en |
dc.subject | Elastic modulus | en |
dc.subject | 경도 | en |
dc.subject | Hardness | en |
dc.subject | 표면 거칠기 | en |
dc.subject | Roughness | en |
dc.title | Stress gradient relaxation and property modification of polysilicon films by ion implantation | en |
dc.type | Thesis | - |
dc.contributor.department | 기계항공공학부 | - |
dc.description.degree | Master | en |
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