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Fabrication and electrical characteristics of high-performance ZnO nanorod field-effect transistors

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dc.contributor.authorPark, Won Il-
dc.contributor.authorKim, Jin Suk-
dc.contributor.authorYi, Gyu-Chul-
dc.contributor.authorBae, M. H.-
dc.contributor.authorLee, H.-J.-
dc.date.accessioned2009-06-23T06:07:11Z-
dc.date.available2009-06-23T06:07:11Z-
dc.date.issued2004-11-22-
dc.identifier.citationAppl. Phys. Lett. 85, 5052 (2004)en
dc.identifier.issn0003-6951 (print)-
dc.identifier.issn1077-3118 (online)-
dc.identifier.urihttps://hdl.handle.net/10371/4890-
dc.identifier.urihttp://link.aip.org/link/?APPLAB/85/5052/1-
dc.description.abstractWe report on fabrication and electrical characteristics of high-mobility field-effect transistors (FETs) using ZnO nanorods. For FET fabrications, single-crystal ZnO nanorods were prepared using catalyst-free metalorganic vapor phase epitaxy. Although typical ZnO nanorod FETs exhibited good electrical characteristics, with a transconductance of similar to140 nS and a mobility of 75 cm(2)/V s, the device characteristics were significantly improved by coating a polyimide thin layer on the nanorod surface, exhibiting a large turn-ON/OFF ratio of 10(4)-10(5), a high transconductance of 1.9 muS, and high electron mobility above 1000 cm(2)/V s. The role of the polymer coating in the enhancement of the devices is also discussed. (C) 2004 American Institute of Physics.en
dc.language.isoenen
dc.publisherAmerican Institute of Physicsen
dc.subjectGROWTHen
dc.subjectARRAYSen
dc.subjectDCen
dc.titleFabrication and electrical characteristics of high-performance ZnO nanorod field-effect transistorsen
dc.typeArticleen
dc.contributor.AlternativeAuthor이규철-
dc.contributor.AlternativeAuthor박원일-
dc.contributor.AlternativeAuthor김진석-
dc.identifier.doi10.1063/1.1821648-
dc.identifier.doi10.1063/1.1821648-
dc.citation.journaltitleApplied Physics Letters-
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