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SOI MEMS 공정의 면적 최소화를 위한 웨이퍼수준 밀봉 실장 기술 : Wafer-level hermetic packaging technology for area minimization in SOI MEMS process

DC Field Value Language
dc.contributor.advisor조동일-
dc.contributor.author이상철-
dc.date.accessioned2010-02-02T16:09:29Z-
dc.date.available2010-02-02T16:09:29Z-
dc.date.copyright2007.-
dc.date.issued2007-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000045162kog
dc.identifier.urihttps://hdl.handle.net/10371/48938-
dc.description學位論文(博士)--서울大學校 大學院 :電氣·컴퓨터工學部,2007.ko
dc.format.extentvii, 94장ko
dc.language.isokoko
dc.publisher서울大學校 大學院ko
dc.subject미세전기기계시스템ko
dc.subjectMEMSko
dc.subject멤즈ko
dc.subjectwafer-level hermetic packagingko
dc.subject통전로ko
dc.subjectelectrical feed throughko
dc.subject웨이퍼수준ko
dc.subject밀봉ko
dc.subject실장ko
dc.titleSOI MEMS 공정의 면적 최소화를 위한 웨이퍼수준 밀봉 실장 기술ko
dc.title.alternativeWafer-level hermetic packaging technology for area minimization in SOI MEMS processko
dc.typeThesis-
dc.contributor.department電氣·컴퓨터工學部-
dc.description.degreeDoctorko
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