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Deposition and solid phase crystallization of a-Si Ge films and application to thin film transistor : 비정질 Si Ge 합금 박막의 증착 및 이의 고상 결정화 거동과 박막 트랜지스터에의 응용

DC Field Value Language
dc.contributor.advisor김상주-
dc.contributor.author김진원-
dc.date.accessioned2010-02-05T06:41:46Z-
dc.date.available2010-02-05T06:41:46Z-
dc.date.copyright1996.-
dc.date.issued1996-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000082186eng
dc.identifier.urihttps://hdl.handle.net/10371/50821-
dc.descriptionThesis (doctoral)--서울대학교 대학원 :금속공학과 재료공학전공,1996.en
dc.format.extentix, 100 p.en
dc.language.isoenen
dc.publisher서울대학교 대학원en
dc.subjectsolid phase crystallizationen
dc.subjectthin film transistoren
dc.subjectlow pressure chemical vapor depositionen
dc.subjectSi₂H?en
dc.subjectGeH₄en
dc.titleDeposition and solid phase crystallization of a-Si Ge films and application to thin film transistoren
dc.title.alternative비정질 Si Ge 합금 박막의 증착 및 이의 고상 결정화 거동과 박막 트랜지스터에의 응용-
dc.typeThesis-
dc.contributor.department금속공학과 재료공학전공-
dc.description.degreeDoctoren
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